The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Apr. 18, 2006
Viktor Gruev, Philadelphia, PA (US);
Jan Van Der Spiegel, Philadelphia, PA (US);
Nader Engheta, Wayne, PA (US);
Viktor Gruev, Philadelphia, PA (US);
Jan Van der Spiegel, Philadelphia, PA (US);
Nader Engheta, Wayne, PA (US);
The Trustees of The University of Pennsylvania, Philadelphia, PA (US);
Abstract
A polarimetric imaging system employs a pixel pitch matched filter for use within, for example, a 2 by 2 pixel neighborhood, in which one pixel samples the scene via a 0 degree polarization filter and a second pixel samples the scene via a 45 degree polarization filter. The remaining two pixels record the intensity of the light within the 2 by 2 neighborhoods. The polarization filters employ organic materials such as polymers or metallic materials that are patterned and etched using reactive ion etching (RIE) or other appropriate etching technique in order to create 14 micron or smaller circular (or square) periodic structures that are patterned into polarization thin films that are deposited on an imaging sensor that includes a processor that computes from the polarization-filtered inputs the first three Stokes parameters in real-time.