The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2009

Filed:

Jul. 28, 2005
Applicants:

Loon-seng Tan, Centerville, OH (US);

Jong-beom Baek, Chungbuk, KR;

Inventors:

Loon-Seng Tan, Centerville, OH (US);

Jong-Beom Baek, Chungbuk, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G 63/06 (2006.01); C08G 63/12 (2006.01); C08G 73/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

Hyperbranched benzazole polymers having repeating units of the formula: wherein Q is —O—, —S— or —NH—, and the terminal groups R are carboxylic acids with their total number equals n+1. A generic method for preparing the polymers is provided. Also provided are the star block copolymers derived from these hyperbranched benzazole polymers and linear poly(ether-ketones) having the following generic formula where x and y are the numbers of repeat units for each poly(ether-ketone) chain; the placement of the carbonyl moieties in the repeat units of the poly(ether-ketone) chains can be either meta or para to the phenoxy groups; the maximal number of poly(ether-ketone) chains is n+1, where n=number of repeat units for hyperbranched polybenzazole). A general method for synthesizing these star block copolymers is provided.


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