The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2009

Filed:

Nov. 30, 2006
Applicants:

Nobuaki Asai, Hashima-gun, JP;

Emi Morioka, Shizuoka, JP;

Inventors:

Nobuaki Asai, Hashima-gun, JP;

Emi Morioka, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is provided of fabricating a reflective mirror having a reflective surface on which light is incident. This method includes: coating at least one of opposite faces of a plate-shaped etchable material made of a single crystal material, with a film-like etching mask; forming a mask pattern on at least one of opposite faces of the etching mask, the mask pattern having a planar shape to which a circle is more similar than a quadrangle; and wet-etching the etchable material. This method allows the reflective mirror to be fabricated so as to have a silhouette of a planar shape to which a circle is more similar than a quadrangle, when viewed in a direction normal to the reflective surface.


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