The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2009

Filed:

Jun. 19, 2006
Applicants:

Bharat Sampathkumaran Bagepalli, Niskayuna, NY (US);

Patrick Lee Jansen, Scotia, NY (US);

Gary R. Barnes, Delanson, NY (US);

Thomas Frank Fric, Greer, SC (US);

James Patrick Francis Lyons, Niskayuna, NY (US);

Kirk Gee Pierce, Simpsonville, SC (US);

William Edwin Holley, Greer, SC (US);

Corneliu Barbu, Guilderland, NY (US);

Inventors:

Bharat Sampathkumaran Bagepalli, Niskayuna, NY (US);

Patrick Lee Jansen, Scotia, NY (US);

Gary R. Barnes, Delanson, NY (US);

Thomas Frank Fric, Greer, SC (US);

James Patrick Francis Lyons, Niskayuna, NY (US);

Kirk Gee Pierce, Simpsonville, SC (US);

William Edwin Holley, Greer, SC (US);

Corneliu Barbu, Guilderland, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F01D 11/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A control system for a rotary machine is provided. The rotary machine has at least one rotating member and at least one substantially stationary member positioned such that a clearance gap is defined between a portion of the rotating member and a portion of the substantially stationary member. The control system includes at least one clearance gap dimension measurement apparatus and at least one clearance gap adjustment assembly. The adjustment assembly is coupled in electronic data communication with the measurement apparatus. The control system is configured to process a clearance gap dimension signal and modulate the clearance gap dimension.


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