The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2009

Filed:

Aug. 30, 2005
Applicants:

Yoshitaka Kinomura, Gifu, JP;

Teruo Hiraoka, Tokyo, JP;

Kojiro Ohkawa, Osaka, JP;

Inventors:

Yoshitaka Kinomura, Gifu, JP;

Teruo Hiraoka, Tokyo, JP;

Kojiro Ohkawa, Osaka, JP;

Assignees:

Sanyo Electric Co., Ltd., Osaka, JP;

Giga Tech Inc., Tokyo, JP;

Ohkawa & Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a cleaning apparatus which can remove an organic material for an organic EL element attaching to a mask made of a thin metal film. The cleaning apparatus of the invention includes first and second cleaning tanks cleaning a mask with a predetermined cleaning solution at room temperature, first and second rinse tanks rinsing the mask with a predetermined rinse solution at room temperature, and a carrying device holding the mask at a predetermined angle other than horizontally and carrying the mask held at the predetermined angle to the first and second cleaning tanks and the first and second rinse tanks without damage occurring to the thin metal film of the mask by stress caused by gravity. The carrying device holds the mask horizontally at first, stands up in a vertical direction while holding the mask to hold the mask at the predetermined angle.


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