The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Jan. 26, 2004
Shih-jong J. Lee, Bellevue, WA (US);
Tuan Phan, Lynnwood, WA (US);
Shih-Jong J. Lee, Bellevue, WA (US);
Tuan Phan, Lynnwood, WA (US);
DRVision Technologies LLC, Bellevue, WA (US);
Abstract
A two pass Zone Of Influence (ZOI) creation method creates a Zone Of Influence (ZOI) image. The two pass ZOI creation method performs a first pass scan to create a first pass intermediate distance image and a shortest distance component label image. It then performs a second pass scan using the first pass intermediate distance image and the shortest distance component label image to create a background distance transform image and a updated shortest distance component label image. An adaptive image region partition method allows distance lengths of the two pass adaptive ZOI creation method depend on their associated component labels.