The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7580551 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 25, 2009

Filed:

Jun. 30, 2003
Applicants:

Sargur Srihari, Williamsville, NY (US);

Yong-chul Shin, Williamsville, NY (US);

Sangjik Lee, Buffalo, NY (US);

Venugoal Govindaraju, Williamsville, NY (US);

Sung-hyuk Cha, Pleasantville, NY (US);

Catalin I. Tomai, Tonawanda, NY (US);

Bin Zhang, Tonawanda, NY (US);

Ajay Shekhawat, Buffalo, NY (US);

Dave Bartnik, Elma, NY (US);

Wen-jann Yang, Amherst, NY (US);

Srirangaraj Setlur, Getzville, NY (US);

Phil Kilinskas, East Amherst, NY (US);

Fred Kunderman, Niagara Falls, NY (US);

Xia Liu, Williamsville, NY (US);

Zhixin Shi, Williamsville, NY (US);

Vemulapati Ramanaprasad, Amherst, NY (US);

Inventors:

Sargur Srihari, Williamsville, NY (US);

Yong-Chul Shin, Williamsville, NY (US);

Sangjik Lee, Buffalo, NY (US);

Venugoal Govindaraju, Williamsville, NY (US);

Sung-Hyuk Cha, Pleasantville, NY (US);

Catalin I. Tomai, Tonawanda, NY (US);

Bin Zhang, Tonawanda, NY (US);

Ajay Shekhawat, Buffalo, NY (US);

Dave Bartnik, Elma, NY (US);

Wen-Jann Yang, Amherst, NY (US);

Srirangaraj Setlur, Getzville, NY (US);

Phil Kilinskas, East Amherst, NY (US);

Fred Kunderman, Niagara Falls, NY (US);

Xia Liu, Williamsville, NY (US);

Zhixin Shi, Williamsville, NY (US);

Vemulapati Ramanaprasad, Amherst, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A computer based method of biometric analysis which compares a first vector from a first biometric sample with a second vector from a second biometric sample. The vectors have at least one biometric feature. A method which compares two biometric samples. The samples form at least one cluster of at least one vector based on feature similarities between the samples. An apparatus incorporating a means for performing the method taught herein. A computer-readable medium and a propagated computer data signal transmitted via a propagation medium, with instructions which when executed by a processor, carry out the method of the present invention. A method of handwriting analysis which calculates a first metric from a first vector having at least one feature from a sample, calculates a second metric from a second vector having at least one feature from a second sample, and calculates the distance in two-dimensional feature space between metrics.


Find Patent Forward Citations

Loading…