The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7578953 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 25, 2009

Filed:

Feb. 07, 2007
Applicants:

Charles H. Winter, Bloomfield Hills, MI (US);

Dwayne Back, Royal Oak, MI (US);

Elena Sebe, West Bloomfield, MI (US);

Inventors:

Charles H. Winter, Bloomfield Hills, MI (US);

Dwayne Back, Royal Oak, MI (US);

Elena Sebe, West Bloomfield, MI (US);

Assignee:

Sulfo Technologies, LLC, Madison Heights, MI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B27N 3/08 (2006.01); B05D 7/22 (2006.01); B05D 3/12 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An article is sulfonated by forming a sulfonating gas composition containing a gaseous sulfur-containing compound provided from a gas source. The gas source may utilize a chemical feed stock that includes a precursor sulfur-containing compound. The article is then contacted with the sulfur-containing gas until a surface treatment is effected. Next, the article is then optionally contacted with a gaseous neutralization composition, and then a liquid neutralization composition. In another sulfonation method, a first test sample is sulfonated and then analyzed by inductively coupled plasma analysis and X-ray fluorescence spectroscopy. A calibration relationship between the two spectroscopic techniques is determined with the inductively coupled plasma atomic spectroscopic value taken as the accurate value. In subsequent sulfonation runs, test samples are included and monitored by X-ray fluorescence.


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