The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2009

Filed:

Aug. 03, 2007
Applicants:

Yizhen Lin, Gllbert, AZ (US);

Marco Fuhrmann, Mesa, AZ (US);

Andrew C. Mcneil, Chandler, AZ (US);

Inventors:

Yizhen Lin, Gllbert, AZ (US);

Marco Fuhrmann, Mesa, AZ (US);

Andrew C. McNeil, Chandler, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01P 15/00 (2006.01); G01P 15/125 (2006.01);
U.S. Cl.
CPC ...
Abstract

A symmetrical differential capacitive sensor () includes a movable element () pivotable about a geometrically centered rotational axis (). The element () includes sections (). Each of the sections () has a stop () spaced equally away from the rotational axis (). Each of the sections () also has a different configuration () of apertures (). The configurations () of apertures () create a mass imbalance between the sections () so that the element () pivots about the rotational axis () in response to acceleration. The apertures () also facilitate etch release during manufacturing and reduce air damping when the element () rotates. Apertures () are formed in electrodes () underlying the apertures () to match the capacitance between the two sections () of movable element () to provide the same bi-directional actuation capability.


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