The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2009

Filed:

Mar. 17, 2006
Applicants:

Shiho Kamisawa, Odawara, JP;

Kenji Ichikawa, Odawara, JP;

Inventors:

Shiho Kamisawa, Odawara, JP;

Kenji Ichikawa, Odawara, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 7/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a master disk with high flexibility and high close contact property with a slave disk to be transferred, which bears information to be transferred by magnetic transfer. When incident angle of X-ray is designated by θ, electroforming is performed such that X-ray diffraction pattern of the master substratehas a 200 plane reflection at 2θ=51.0° to 53.0°, and a 220 plane reflection at 2θ=75.5° to 76.5°, and the reflection intensity ratio of X-ray diffraction of the 220 plane with respect to the 200 plane is I[220]/I[200]=2 to 30.


Find Patent Forward Citations

Loading…