The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2009

Filed:

May. 30, 2006
Applicants:

Nathan J. Litke, San Francisco, CA (US);

Martin Rumpf, Bonn, DE;

Inventors:

Nathan J. Litke, San Francisco, CA (US);

Martin Rumpf, Bonn, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, apparatus, and article of manufacture provide the ability to construct an optimal parameterization for a discrete surface patch. A three-dimensional image having a surface is selected. An initial parameterization of the surface onto a two-dimensional plane is constructed. A distortion of the initial parameterization is measured. A length parameter, an area parameter, and an angle parameter are specified. The initial parameterization is then optimized through a discrete deformation of a parameter domain that minimizes the distortion based on the length, area, and angle parameter.


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