The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
Jun. 15, 2001
Hironori Kobayashi, Shinjuku-ku, JP;
Manabu Yamamoto, Shinjuku-ku, JP;
Daigo Aoki, Shinjuku-ku, JP;
Hironori Kamiyama, Shinjuku-Ku, JP;
Shinichi Hikosaka, Shinjuku-Ku, JP;
Mitsuhiro Kashiwabara, Shinjuku-Ku, JP;
Hironori Kobayashi, Shinjuku-ku, JP;
Manabu Yamamoto, Shinjuku-ku, JP;
Daigo Aoki, Shinjuku-ku, JP;
Hironori Kamiyama, Shinjuku-Ku, JP;
Shinichi Hikosaka, Shinjuku-Ku, JP;
Mitsuhiro Kashiwabara, Shinjuku-Ku, JP;
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Abstract
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.