The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
Jun. 29, 2005
Stefan Bangert, Steinau, DE;
Wolfgang Buschbeck, Hanau, DE;
Markus Hanika, Landsberg, DE;
Karl-albert Keim, Budingen, DE;
Michael Konig, Frankfurt am Main, DE;
Jorg Krempel-hesse, Eckartsborn, DE;
Andreas Lopp, Freigericht, DE;
Harald Rost, Mainhausen, DE;
Jurgen Schroeder, Grosskkrotzenburg, DE;
Tobias Stolley, Frankfurt am Main, DE;
Stefan Bangert, Steinau, DE;
Wolfgang Buschbeck, Hanau, DE;
Markus Hanika, Landsberg, DE;
Karl-Albert Keim, Budingen, DE;
Michael Konig, Frankfurt am Main, DE;
Jorg Krempel-Hesse, Eckartsborn, DE;
Andreas Lopp, Freigericht, DE;
Harald Rost, Mainhausen, DE;
Jurgen Schroeder, Grosskkrotzenburg, DE;
Tobias Stolley, Frankfurt am Main, DE;
Applied Materials GmbH & Co. KG, Alzenau, DE;
Abstract
The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.