The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
Jun. 30, 2006
Applicant:
Hiroyuki Yoshida, Wakayama, JP;
Inventor:
Hiroyuki Yoshida, Wakayama, JP;
Assignee:
Kao Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); C01B 33/20 (2006.01); B24D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a process for preparing a polishing composition comprising a colloidal silica prepared from a silicate. The first step involves adjusting the pH of a silica dispersion comprising colloidal silica, having an average particle size of primary particles of 1 nm or more and less than 40 nm, to a range of from 10 to 14. The second step involves re-adjusting the pH of the silica dispersion obtained in the first step to a range of from 1 to 6. A density of silanol groups is formed on the surface of the colloidal silica that is from 0.06 to 0.3 mmol per 1 g of the colloidal silica.