The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
Mar. 23, 2007
Yoshiyuki Imanaka, Kanagawa, JP;
Teruo Ozaki, Kanagawa, JP;
Takuya Hatsui, Tokyo, JP;
Takaaki Yamaguchi, Kanagawa, JP;
Ichiro Saito, Kanagawa, JP;
Muga Mochizuki, Kanagawa, JP;
Toshiyasu Sakai, Kanagawa, JP;
Yoshiyuki Imanaka, Kanagawa, JP;
Teruo Ozaki, Kanagawa, JP;
Takuya Hatsui, Tokyo, JP;
Takaaki Yamaguchi, Kanagawa, JP;
Ichiro Saito, Kanagawa, JP;
Muga Mochizuki, Kanagawa, JP;
Toshiyasu Sakai, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
This invention relates to a printhead substrate capable of suppressing an increase in wiring width and an increase in the size of a substrate formed by a film forming process while increasing the number of simultaneously driven printing elements in order to improve the printing performance, a printhead using the substrate, and a printing apparatus using the printhead. The wiring lines of the substrate are formed into a common wiring line, and energy applied to a heating resistance element is prevented from deviating from a stable ink discharge range owing to the difference in the number of simultaneously driven heating resistance elements. For this purpose, a driving element is greatly downsized in comparison with a conventional one, and the operation region of a MOS transistor is shifted from the non-saturation region to the saturation region.