The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2009

Filed:

Aug. 31, 2004
Applicants:

William Martin Silvis, Ann Arbor, MI (US);

Norbert Kreft, Ann Arbor, MI (US);

Gerald Marek, Ann Arbor, MI (US);

Wolfgang Schindler, Graz, AT;

Inventors:

William Martin Silvis, Ann Arbor, MI (US);

Norbert Kreft, Ann Arbor, MI (US);

Gerald Marek, Ann Arbor, MI (US);

Wolfgang Schindler, Graz, AT;

Assignee:

AVL North America Inc., Plymouth, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01); G01N 37/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exhaust emission analysis system is provided that includes an exhaust and dilution gas source respectively providing exhaust and dilution gases. A dilution unit includes exhaust and dilution gas mass flow controllers, fluidly connected to the exhaust and dilution gas sources. The mass flow controllers define a gas flow rate of gas from their respective gas source. A connection mixes the gases to provide a diluted exhaust gas having an incorrect dilution ratio. A water measurement device measures the water content of the exhaust gas. A water content dilution signal is sent from the water measurement device to a control device. An adjustment factor is calculated by the controller and a flow rate command signal is sent from the controller, to the exhaust gas mass flow controller to adjust the gas flow rate of the exhaust gas and provide a corrected dilution ratio at the connection.


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