The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2009

Filed:

Jun. 27, 2005
Applicants:

Uwe Jan Schmidt, Dresden, DE;

Thilo Sandner, Dresden, DE;

Harald Schenk, Dresden, DE;

Alexandre Gatto, Aalen, DE;

Minghong Yang, Berlin, DE;

Jörg Heber, Erfurt, DE;

Norbert Kaiser, Jena, DE;

Inventors:

Uwe Jan Schmidt, Dresden, DE;

Thilo Sandner, Dresden, DE;

Harald Schenk, Dresden, DE;

Alexandre Gatto, Aalen, DE;

Minghong Yang, Berlin, DE;

Jörg Heber, Erfurt, DE;

Norbert Kaiser, Jena, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to micromechanical mirrors with a high-reflection coating for the deep-ultraviolet (DUV) and vacuum-ultraviolet (VUV) spectral range, based on a substrate which is coated with an aluminum layer and a transparent blooming coating. Likewise the invention relates to a method for the production of such micromechanical layers with a high-reflection coating and to the use thereof for the production of microsensors, optical data stores or video and data projection displays.


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