The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2009

Filed:

Nov. 04, 2004
Applicants:

Hugues Herve Hoppe, Redmond, WA (US);

John Michael Snyder, Redmond, WA (US);

Pedro Vieira Sander, Cambridge, MA (US);

Steven Jacob Gortler, Cambridge, MA (US);

Inventors:

Hugues Herve Hoppe, Redmond, WA (US);

John Michael Snyder, Redmond, WA (US);

Pedro Vieira Sander, Cambridge, MA (US);

Steven Jacob Gortler, Cambridge, MA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 15/30 (2006.01); G06T 15/40 (2006.01); G09G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods are provided for optimizing the geometric stretch of a parametrization scheme. Given an arbitrary mesh, the systems and methods construct a progressive mesh (PM) such that all meshes in the PM sequence share a common texture parametrization. The systems and methods minimize geometric stretch, i.e., small texture distances mapped onto large surface distances, to balance sampling rates over all locations and directions on the surface. The systems and methods also minimize texture deviation, i.e., 'slippage' error based on parametric correspondence, to obtain accurate textured mesh approximations. The technique(s) begin by partitioning the mesh into charts using planarity and compactness heuristics. Then, the technique(s) proceed by creating a stretch-minimizing parametrization within each chart, and by resizing the charts based on the resulting stretch. Then, the technique(s) simplify the mesh while respecting the chart boundaries. Next, the parametrization is re-optimized to reduce both stretch and deviation over the whole PM sequence. The charts may then be packed into a texture atlas for improved texture mapping in connection with a parametrization scheme.


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