The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2009

Filed:

Sep. 21, 2006
Applicants:

Andrew Gabriel Rinzler, Newberry, FL (US);

Zhuangchun Wu, Gainesville, FL (US);

Inventors:

Andrew Gabriel Rinzler, Newberry, FL (US);

Zhuangchun Wu, Gainesville, FL (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming patterned thin films includes the steps of providing a porous membrane and a solution including a plurality of solid constituents and at least one surface stabilizing agent for preventing the solid constituents from flocculating out of suspension. The solution is dispensed onto a surface of the membrane. The solution is then removed by filtration through the membrane, wherein a patterned film coated membrane comprising a plurality of primarily spaced apart patterned regions are formed on the membrane. In one embodiment the method further includes the step of blocking liquid passage through selected portions of the membrane to form a plurality of open membrane portions and a plurality of blocked membrane portions before the dispensing step. The dispensing step includes ink jet printing the solution. An article having a patterned nanotube-including film thereon includes a substrate, and a patterned nanotube including film disposed on the substrate. The film includes a plurality of primarily spaced apart patterned regions, wherein nanotubes in the film are preferentially aligned parallel to a long direction of the patterned regions. The preferential alignment is generally most pronounced towards an edge of the patterned regions.


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