The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2009
Filed:
May. 13, 2003
Charles H. Dennison, San Jose, CA (US);
Alice T. Wang, Milpitas, CA (US);
Kanaiyalal Chaturbhai Patel, Fremont, CA (US);
Jenn C. Chow, Campbell, CA (US);
Charles H. Dennison, San Jose, CA (US);
Alice T. Wang, Milpitas, CA (US);
Kanaiyalal Chaturbhai Patel, Fremont, CA (US);
Jenn C. Chow, Campbell, CA (US);
Other;
Abstract
A method comprising forming a first dielectric layer over an electrode formed to a first contact point on a substrate, the electrode having a contact area; patterning the first dielectric layer into a body, a thickness of the first dielectric layer defining a side wall; forming at least one spacer along the side wall of the first dielectric body, the at least one spacer overlying a portion of the contact area; forming a second dielectric layer on the contact area; removing the at least one spacer; and forming a material comprising a second contact point to the contact area. An apparatus comprising a volume of programmable material; a conductor; and an electrode disposed between the volume of programmable material and the conductor, the electrode having a contact area coupled to the volume of programmable material.