The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7572413 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 11, 2009

Filed:

Jul. 26, 2006
Applicants:

Bor-yuan Hsiao, Tu-Cheng, TW;

Ching-chou Chang, Tu-Cheng, TW;

Chi-chuang Ho, Tu-Cheng, TW;

Inventors:

Bor-Yuan Hsiao, Tu-Cheng, TW;

Ching-Chou Chang, Tu-Cheng, TW;

Chi-Chuang Ho, Tu-Cheng, TW;

Assignee:

Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01); C09C 3/00 (2006.01); D01F 9/12 (2006.01); B01J 8/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for manufacturing carbon nanotubes is provided. The apparatus includes: a reaction chamber having an inlet and a outlet; a heater for elevating an interior temperature of the reaction chamber; and a gas guiding member coupled to the inlet and configured for introducing a carbon-containing gas into the reaction chamber, the gas guiding member including a gas-exiting portion arranged in the reaction chamber, the gas-exiting portion having a cavity defined therein and a flat perforated top wall, the perforated top wall being configured for supporting a substrate thereon and defining a route allowing the introduced carbon-containing gas to flow in a direction substantially perpendicular to a main plane of the substrate.


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