The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2009

Filed:

Jul. 06, 2005
Applicant:

Tadashi Watanabe, Kamiina-gun, JP;

Inventor:

Tadashi Watanabe, Kamiina-gun, JP;

Assignee:

Olympus Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multilayer minus filter for reflecting a light having a predetermined wavelength and transmitting a light having a wavelength longer than and shorter than the predetermined wavelength, includes a repetition layer such that a sum of an average value of optical thickness of a high refractive index layer and an average value of optical thickness of a low refractive index layer is substantially equal to a reflection wavelength λwith respect to a vertically incident light, wherein, when a rate H/L between the optical thickness H of the high reflective index layer and the optical thickness L of the low reflective index layer in the repetition layer of the high refractive index layer and the low refractive index layer is larger than 0.5 and smaller than 2, a reflection band formed in the reflection wavelength λby the repetition layer is utilized.


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Watanabe, Tadashi. (2009). Multilayer minus filter and fluorescence microscope (U.S. Patent No. 7570428). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7570428

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