The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Mar. 25, 2005
Daniel R. Klemer, Lexington, VA (US);
Charles B. Gause, Providence, NC (US);
Steven A. Stevenson, Hattiesburg, MS (US);
Daniel R. Klemer, Lexington, VA (US);
Charles B. Gause, Providence, NC (US);
Steven A. Stevenson, Hattiesburg, MS (US);
Luna Innovations Incorporated, Roanoke, VA (US);
Abstract
An exemplary optical limiter device () has an optically transmissive substrate () and a layer () on a first surface () of the substrate, the layer having a trimetallic nitride endohedral metallofullerene. The layer can be a thin film of the trimetallic nitride endohedral metallofullerene, a layer material with a cavity containing a solution with the trimetallic nitride endohedral metallofullerene, a sol-gel with a trimetallic nitride endohedral metallofullerene, and a self assembled monolayer with a trimetallic nitride endohedral metallofullerene. The layers of trimetallic nitride endohedral metallofullerenes can be vapor deposited, solution deposited and/or self assembled onto optical components. The third-order nonlinear properties of these films provide desired transmission characteristics.