The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2009

Filed:

Oct. 27, 2006
Applicants:

Seung-joon Yoo, Yongin-si, KR;

Cheol-hyeon Chang, Yongin-si, KR;

Su-kyung Lee, Yongin-si, KR;

Won-il Lee, Yongin-si, KR;

Inventors:

Seung-Joon Yoo, Yongin-si, KR;

Cheol-Hyeon Chang, Yongin-si, KR;

Su-Kyung Lee, Yongin-si, KR;

Won-Il Lee, Yongin-si, KR;

Assignee:

Samsung SDI Co., Ltd., Suwon-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 63/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron emission display includes first and second substrates facing each other, a plurality of driving electrodes formed on the first substrate, a plurality of electron emission regions controlled by the driving electrodes, a focusing electrode disposed on and insulated from the driving electrodes and provided with openings through which electron beams pass, a plurality of phosphor layers formed on a surface of the second substrate, an anode electrode formed on surfaces of the phosphor layers, and a plurality of spacers for maintaining a gap between the first and second substrates. Among the electron emission regions disposed in the opening adjacent to the spacer, one electron emission region, which is closest to the adjacent spacer, is spaced apart from an inner wall of the opening by a first distance that is different from a second distance from another electron emission region, which is farthest from the adjacent spacer, to the inner wall of the opening.


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