The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7569334 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 04, 2009

Filed:

Apr. 17, 2003
Applicants:

Hironori Kobayashi, Tokyo, JP;

Yudai Yamashita, Tokyo, JP;

Inventors:

Hironori Kobayashi, Tokyo, JP;

Yudai Yamashita, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the present invention, the problem of stability deterioration of the obtained conductive pattern substrate at the time of forming a conductive pattern by an additive method when a layer having reactivity remains on the substrate is to be solved. According to pattern exposure with a photo catalyst substratehaving a photo catalyst layerlaminated on a second substratesuperimposed onto a wettability changeable substratewith a wettability changeable layerlaminated on a first substratea wettability pattern is formed. And furthermore, by adhering a conductive coating solution, or the like, a conductive pattern substrate without containing a photo catalyst can be manufactured.


Find Patent Forward Citations

Kobayashi, Hironori. (2009). Method of manufacturing for conductive pattern substrate (U.S. Patent No. 7569334). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7569334

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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