The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2009

Filed:

Feb. 25, 2005
Applicants:

Mitsuharu Isobe, Tokyo, JP;

Hiromichi Umehara, Tokyo, JP;

Hirotaka Gomi, Tokyo, JP;

Tomohide Yokozawa, Kwai Chung, HK;

Inventors:

Mitsuharu Isobe, Tokyo, JP;

Hiromichi Umehara, Tokyo, JP;

Hirotaka Gomi, Tokyo, JP;

Tomohide Yokozawa, Kwai Chung, HK;

Assignees:

TDK Corporation, Tokyo, JP;

SAE Magnetics (H.K.) Ltd., Kwai Chung, HK;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.


Find Patent Forward Citations

Loading…