The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2009

Filed:

Dec. 21, 2004
Applicants:

Hyun Sik Seo, Gyeonggi-Do, KR;

Yun Ho Jung, Seoul, KR;

Young Joo Kim, Gyeonggi-Do, KR;

Jaesung You, Seoul, KR;

Inventors:

Hyun Sik Seo, Gyeonggi-Do, KR;

Yun Ho Jung, Seoul, KR;

Young Joo Kim, Gyeonggi-Do, KR;

JaeSung You, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
Abstract

A laser mask includes a mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved. The laser mask includes a mask pattern that includes transmitting regions and a blocking region. The edges of the mask have shapes inverted to the shapes of the edges of a silicon thin film crystallized by the pattern.


Find Patent Forward Citations

Seo, Hyun. (2009). Laser mask and crystallization method using the same (U.S. Patent No. 7569307). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7569307

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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