The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Jul. 01, 2004
Hubert Grange, Grenoble, FR;
Bernard Diem, Echirolles, FR;
Sylvie Viollet Bosson, Vif, FR;
Michel Borel, Saint Vincent de Mercuze, FR;
Hubert Grange, Grenoble, FR;
Bernard Diem, Echirolles, FR;
Sylvie Viollet Bosson, Vif, FR;
Michel Borel, Saint Vincent de Mercuze, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
A useful layer () is initially attached by a sacrificial layer () to a layer () forming a substrate. Before etching of the sacrificial layer (), at least a part of the surface () of at least one of the layers in contact with the sacrificial layer () is doped. After etching of the sacrificial layer (), the surface () is superficially etched so as to increase the roughness of its doped part. After doping, a mask () is deposited on a part of the useful layer () so as to delineate a doped zone and a non-doped zone of the surface (), one of the zones forming a stop after the superficial etching phase.