The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2009

Filed:

Dec. 01, 2005
Applicants:

Tao Hong, Suwon-si, KR;

Chong-sam Chung, Hwaseong-si, KR;

Tae-kyung Kim, Seoul, KR;

Woo-seok Choi, Seoul, KR;

Inventors:

Tao Hong, Suwon-si, KR;

Chong-sam Chung, Hwaseong-si, KR;

Tae-kyung Kim, Seoul, KR;

Woo-seok Choi, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 7/20 (2006.01); G11B 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multilayer recording medium that prevents deterioration of a signal characteristic due to a mirror effect that may occur between recording layers and a method of manufacturing the same, the multilayer recording medium having at least two recording layers, wherein a thickness of at least one spacer layer between adjacent recording layers is different from a thickness of the other spacer layers such that a beam focusing on a recording layer is prevented from focusing on another recording layer corresponding to a mirror layer due to reflection. In the multilayer recording medium, a mirror effect is greatly reduced. In addition, the thickness of only a spacer layer exerting the most significant influence on the mirror effect is changed to prevent the deterioration of signal quality due to the mirror effect, and therefore, the structure of a multilayer recording medium is simplified.


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