The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2009

Filed:

Sep. 26, 2007
Applicants:

Ralph N. Wall, Beaverton, OR (US);

Guillaume Bouche, Beaverton, OR (US);

Edward Martin Godshalk, Newberg, OR (US);

Rick D. Lutz, Portland, OR (US);

Garth Sundberg, Portland, OR (US);

Inventors:

Ralph N. Wall, Beaverton, OR (US);

Guillaume Bouche, Beaverton, OR (US);

Edward Martin Godshalk, Newberg, OR (US);

Rick D. Lutz, Portland, OR (US);

Garth Sundberg, Portland, OR (US);

Assignee:

Maxim Integrated Products, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 41/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods of contacting the top layer in a BAW device by depositing a metal layer over the BAW device, patterning the metal layer so that the metal layer extends over and contacts the top electrode layer of the BAW device only at a plurality of spaced apart locations adjacent the periphery of the active resonator area, and has a common region laterally displaced from the top and bottom electrodes and electrically interconnecting the parts of the metal layer extending over and contacting the top electrode of the BAW device at the plurality of spaced apart locations.


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