The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Jun. 04, 2004
John Edward Eric Baglin, Morgan Hill, CA (US);
Richard D. Bunch, San Jose, CA (US);
Linden James Crawforth, San Jose, CA (US);
Eric W. Flint, San Jose, CA (US);
Andrew J. Kellock, Sunnyvale, CA (US);
Timothy Clark Reiley, Los Gatos, CA (US);
John Edward Eric Baglin, Morgan Hill, CA (US);
Richard D. Bunch, San Jose, CA (US);
Linden James Crawforth, San Jose, CA (US);
Eric W. Flint, San Jose, CA (US);
Andrew J. Kellock, Sunnyvale, CA (US);
Timothy Clark Reiley, Los Gatos, CA (US);
Hitachi Global Storage Technologies Netherlands, B.V., Amsterdam, NL;
Abstract
Modified strain regions are created in correlation to strain reactive structures that are subjected to a predetermined dimensional precision adjustment. The modified strain regions are created by impacting incident particles into exposed regions of the strain reactive structures. The irradiation by the incident particles creates a predetermined material disruption and consequently a change in strain energy. The strain energy, and the associated dimensional adjustment is dependent on the irradiation process and the sum properties of the modified strain regions and the strain reactive structure.