The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Sep. 15, 2006
Yi LI, Hong Kong, CN;
Jun-yan HU, Hong Kong, CN;
Yi Li, Hong Kong, CN;
Jun-Yan Hu, Hong Kong, CN;
The Hong Kong Polytechnic University, Kowloon, HK;
Abstract
A technique allowing manufacturers to produce woven moisture management fabrics with good moisture transfer properties is based upon a model of the fabric construction, thereby avoiding a manufacturing trial-and-error process. An initial woven fabric design including hydrophilic and hydrophobic yarns are modeled, the warp and weft yarns generally lying in a plane of the fabric. By orthographic projection onto respective planes substantially parallel to the plane of the fabric, a first view and an opposing second view of a unit cell of the model is produced. If the total projected area of hydrophobic yarn on one of the first and second views is between 40% and 70% of the total projected area, and total projected area of hydrophilic yarn on the other of the first and second views exceeds 50% of the total projected area, then a fabric according to the fabric design will have near optimum moisture wicking properties and is manufactured to the design. Otherwise, in an iterative process, one of the factors in the model is varied and the design steps repeated.