The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2009

Filed:

Apr. 08, 2005
Applicants:

Eiichi Tanaka, Tokyo, JP;

Tetsuo Kojima, Tokyo, JP;

Inventors:

Eiichi Tanaka, Tokyo, JP;

Tetsuo Kojima, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the case where, e.g., because of provision of a high-gain and high-energy Q-switched laser oscillator in a laser system in a MOPA configuration, the duration τz from the time point when oscillation-stage Q switches (and) start the gate ON to the time point when a pulse laser beam () starts to grow is shorter than the fall time τf of amplification-stage Q switches (,, and), by implementing control in such a way that the gate-ON timing of the oscillation-stage Q switches (and) lag behind the gate-ON timing of the amplification-stage Q switches (,, and) by a predetermined time, the loss in the pulse laser beam () at the amplification-stage Q switches (,, and) can be prevented, while the gain deterioration due to a spontaneously amplified ray () produced in the amplification stage is being suppressed. Therefore, a high-energy pulse laser beam can efficiently be obtained.


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