The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2009

Filed:

Feb. 28, 2007
Applicant:

Hideaki Fujiwara, Hashima, JP;

Inventor:

Hideaki Fujiwara, Hashima, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device capable of reducing a threshold voltage is obtained. The semiconductor device includes a pair of source/drain regions formed on the main surface of a semiconductor region to hold a channel region therebetween, and a gate electrode formed on the channel region through a gate insulating film and including a metal-containing layer arranged in the vicinity of an interface between the gate insulating film and the gate electrode, wherein the metal-containing layer is so formed in the form of dots as to partially cover the surface of the gate insulating film, and the average distance between dots forming the metal-containing layer is set to not more than a diameter of the dot of the metal-containing layer.


Find Patent Forward Citations

Fujiwara, Hideaki. (2009). Semiconductor device comprising gate electrode (U.S. Patent No. 7564106). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7564106

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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