The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7564061 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 21, 2009

Filed:

Feb. 16, 2005
Applicant:

Takashi Mimura, Kawasaki, JP;

Inventor:

Takashi Mimura, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/72 (2006.01);
U.S. Cl.
CPC ...
Abstract

A field effect transistor having a gate, a source, and a drain formed from metallic materials is disclosed that is able to supply a high driving current. In the field effect transistor, a source region, a drain region and a gate electrode are formed from silicide or other metallic materials. The metallic materials are selected so that in an n-channel MISFET, the work function Wg of the gate electrode and the work function Wg of the source region satisfy the relation of Wg<Ws, and in a p-channel MISFET, work functions of the gate electrode and the source region satisfy the relation of Wg>Ws.


Find Patent Forward Citations

Mimura, Takashi. (2009). Field effect transistor and production method thereof (U.S. Patent No. 7564061). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7564061

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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