The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Dec. 12, 2002
Geun Su Lee, Kyoungki-do, KR;
Jae Chang Jung, Seoul, KR;
Ki Soo Shin, Kyoungki-do, KR;
Keun Kyu Kong, Kyongki-do, KR;
Sung Koo Lee, Seoul, KR;
Young Sun Hwang, Kyoungki-do, KR;
Geun Su Lee, Kyoungki-do, KR;
Jae Chang Jung, Seoul, KR;
Ki Soo Shin, Kyoungki-do, KR;
Keun Kyu Kong, Kyongki-do, KR;
Sung Koo Lee, Seoul, KR;
Young Sun Hwang, Kyoungki-do, KR;
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Abstract
Cleaning solutions for removing photoresist resins and a method of forming patterns using the same are disclosed. The cleaning solution includes water (HO) as main component, one or more surfactants as additive selected from the group consisting of polyoxyalkylene compounds, a salt of alcohol amine of Formula 1 and hydrocarbon compounds having carboxylic acid (—COOH) group, a salt of alcohol amine of Formula 1 and hydrocarbon compounds having sulfonic acid (—SOH) group, polyethylene glycol compounds, compounds of Formula 3, compounds having a molecular weight ranging from 1000 to 10000 including repeating unit of Formula 4, polyether denatured silicon compounds and alcohol compounds. wherein R, R, R, R, R, A, l and n are defined in the specification.