The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Nov. 12, 2004
Shih-chang Chang, Hsinchu, TW;
Yaw-ming Tsai, Taichung Hsien, TW;
Ryan Lee, Hualien, TW;
Yu-ting Hung, Sinying, TW;
Shih-Chang Chang, Hsinchu, TW;
Yaw-Ming Tsai, Taichung Hsien, TW;
Ryan Lee, Hualien, TW;
Yu-Ting Hung, Sinying, TW;
TPO Displays Corp., Chu-Nan, TW;
Abstract
A method and an apparatus for forming a polycrystalline layer using laser annealing for preventing damage to the peripheral region of the substrate during laser annealing. The laser annealing comprises a shadow mask structure. When crystallizing an amorphous layer by laser annealing, the shadow mask structure shields the peripheral region of the amorphous layer from laser irradiation. A method for forming a polycrystalline layer using the laser annealing apparatus is also provided in the invention.