The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Mar. 22, 2007
Applicant:
Kazuyoshi Ueno, Tokyo, JP;
Inventor:
Kazuyoshi Ueno, Tokyo, JP;
Assignee:
NEC Electronics Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/326 (2006.01);
U.S. Cl.
CPC ...
Abstract
A semiconductor device manufacturing apparatus which uses a thermal CVD reaction to deposit a film onto a substrate has a ring with an electrode terminal that makes contact with either the substrate or the deposited film thereon, a power supply that applies a current or a potential to this electrode terminal of the ring, and a piston cylinder mechanism for moving the ring up and down, so as to cause its electrode terminal to make and break contact with the substrate or deposited film thereon.
Ueno, Kazuyoshi. (2009). Semiconductor device manufacturing apparatus and semiconductor device manufacturing method (U.S. Patent No. 7563696). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7563696
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile