The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Dec. 14, 2005
Jean-christophe Giraudin, Bernin, FR;
Sébastien Cremer, Sassenage, FR;
Philippe Delpech, Meylan, FR;
Jean-Christophe Giraudin, Bernin, FR;
Sébastien Cremer, Sassenage, FR;
Philippe Delpech, Meylan, FR;
STMicroelectronics S.A., Montrouge, FR;
Abstract
A manufacturing process for a capacitor in an interconnection layer includes the following stages: Deposit of a first metallic layer (); Deposit of a first insulator layer () on the first metallic layer (); Deposit of a second metallic layer () on the first insulator layer (); Formation of an upper electrode () in the second layer metallic (); Deposit of a second insulator layer () covering the upper electrode (); Etching of the second insulator layer to form a spacer () on this first insulator layer surrounding the upper electrode (); then Formation of a lower electrode () and a dielectric () by removal of parts from the first metallic layer and insulator not covered by the upper electrode () or the spacer (); and Formation of an interconnection line (). This process allows for manufacturing capacitors with an increased performance, in a simplified fashion at lower cost and with an auto-alignment.