The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2009

Filed:

Jun. 27, 2005
Applicants:

Alan J. Hunt, Plymouth, MI (US);

Gerald Mourou, Ann Arbor, MI (US);

Ajit P. Joglekar, Ann Arbor, MI (US);

Edgar Meyhofer, Ann Arbor, MI (US);

John A. Nees, Ann Arbor, MI (US);

Greg Spooner, Kensington, CA (US);

Inventors:

Alan J. Hunt, Plymouth, MI (US);

Gerald Mourou, Ann Arbor, MI (US);

Ajit P. Joglekar, Ann Arbor, MI (US);

Edgar Meyhofer, Ann Arbor, MI (US);

John A. Nees, Ann Arbor, MI (US);

Greg Spooner, Kensington, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/16 (2006.01); B23K 26/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (<20 nm) and are highly reproducible.


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