The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2009

Filed:

Oct. 24, 2005
Applicants:

Hendryk Richert, Jena, DE;

Uwe Kriltz, Jena, DE;

Armin Schmidt, Zeulenroda, DE;

Roland Weidl, Bollberg, DE;

Gerald Janicke, Bobbau, DE;

Inventors:

Hendryk Richert, Jena, DE;

Uwe Kriltz, Jena, DE;

Armin Schmidt, Zeulenroda, DE;

Roland Weidl, Bollberg, DE;

Gerald Janicke, Bobbau, DE;

Assignee:

Guardian Industries Corp., Auburn Hills, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sputtering target includes an outer target tube, an inner support tube supporting a magnet carrier bar extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling plenum radially between the inner support tube and the outer target tube; and a baffle comprising a substantially flat plate attached to the inner support tube adjacent the opposite end, the plate extending radially within the plenum between the inner support tube and the outer target tube and having an array of flow apertures therein.


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