The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
May. 28, 2003
Toshihiro Matsumoto, Nara, JP;
Akihiko Kojima, Tenri, JP;
Toshihiro Matsumoto, Nara, JP;
Akihiko Kojima, Tenri, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
First rubbing is performed on an entire surface of an alignment film () provided on a substrate (), and then a mask part () for masking a first region and a region of an alignment mark is formed on the alignment film () by using a resist layer (). After performing second rubbing on the alignment film () through the mask part (), the mask part () is removed, and a liquid crystal layer () is formed on the alignment film (). In this way, the alignment mark is formed as a region having an optical function different from an optical function of a region surrounding the alignment mark. Thus, it is possible to produce a substrate () having an alignment mark formed without increasing processing steps at such a position as to contact the liquid crystal layer ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile