The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Oct. 31, 2005
Yong Ju Yun, Chungcheongnam-do, KR;
Chil Seong Ah, Daejeon, KR;
Dong Han Ha, Daejeon, KR;
Hyung Ju Park, Busan, KR;
Wan Soo Yun, Daejeon, KR;
Kwang Cheol Lee, Daejeon, KR;
Gwang Seo Park, Seoul, KR;
Yong Ju Yun, Chungcheongnam-do, KR;
Chil Seong Ah, Daejeon, KR;
Dong Han Ha, Daejeon, KR;
Hyung Ju Park, Busan, KR;
Wan Soo Yun, Daejeon, KR;
Kwang Cheol Lee, Daejeon, KR;
Gwang Seo Park, Seoul, KR;
Korean Research Institute of Standards and Science, Daejeon, KR;
Abstract
Disclosed herein is a method of fabricating nano-components using nanoplates, including the steps of: printing a grid on a substrate using photolithography and Electron Beam Lithography; spraying an aqueous solution dispersed with nanoplates onto the grid portion to position the nanoplates on the substrate; depositing a protective film of a predetermined thickness on the substrate and the nanoplates positioned on the substrate; ion-etching the nanoplates deposited with the protective film by using a Focused Ion Beam (FIB) or Electron Beam Lithography; and eliminating the protective film remaining on the substrate using a protective film remover after the ion-etching of the nanoplates, and a method of manufacturing nanomachines or nanostructures by transporting such nano-components using a nano probe and assembling with other nano-components. The present invention makes it possible to fabricate the high-quality nano-components in a more simple and easier manner at a lower cost, as compared to other conventional methods. Further, the present invention provides a method of implementing nanomachines through combination of such nano-components and biomolecules, etc.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile