The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2009

Filed:

Jan. 25, 2007
Applicants:

Manoj Balachandran, Wappingers Falls, NY (US);

James A. Hagan, Hopewell Junction, NY (US);

Ben Kim, Wappingers Falls, NY (US);

Deoram Persaud, Bronx, NY (US);

Adam D. Ticknor, Poughquag, NY (US);

Wei-tsu Tseng, Hopewell Junction, NY (US);

Inventors:

Manoj Balachandran, Wappingers Falls, NY (US);

James A. Hagan, Hopewell Junction, NY (US);

Ben Kim, Wappingers Falls, NY (US);

Deoram Persaud, Bronx, NY (US);

Adam D. Ticknor, Poughquag, NY (US);

Wei-tsu Tseng, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2006.01); H01L 21/00 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

Processes and apparatuses are disclosed for detecting and characterizing SiCOH-based dielectric materials during integrated circuit fabrication. The processes generally include chromatographically analyzing a fluid stream generated during a process employed for device fabrication, e.g., during a wet strip, a chemical mechanical planarization process and the like.


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