The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Nov. 29, 2006
Sung Hyun Kim, Daejeon, KR;
Kyung Jun Kim, Daejeon, KR;
Dong Chang Choi, Daejeon, KR;
Jeong AE Yoon, Masan-si, KR;
Hee Kwan Park, Daejeon, KR;
Geun Young Cha, Seoul, KR;
Keon Woo Lee, Daejeon, KR;
IL Eok Kwon, Seoul, KR;
Dong Kung OH, Daejeon, KR;
Jong Hyun Park, Daejeon, KR;
Xiang LI LI, Daejeon, KR;
Han Soo Kim, Seoul, KR;
Min Young Lim, Daejeon, KR;
Chang Ho Cho, Daejeon, KR;
Sung Hyun Kim, Daejeon, KR;
Kyung Jun Kim, Daejeon, KR;
Dong Chang Choi, Daejeon, KR;
Jeong Ae Yoon, Masan-si, KR;
Hee Kwan Park, Daejeon, KR;
Geun Young Cha, Seoul, KR;
Keon Woo Lee, Daejeon, KR;
Il Eok Kwon, Seoul, KR;
Dong Kung Oh, Daejeon, KR;
Jong Hyun Park, Daejeon, KR;
Xiang Li Li, Daejeon, KR;
Han Soo Kim, Seoul, KR;
Min Young Lim, Daejeon, KR;
Chang Ho Cho, Daejeon, KR;
LF Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.