The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2009

Filed:

Apr. 21, 2005
Applicants:

Ichiki Takemoto, Kawanishi, JP;

Isao Yoshida, Ikeda, JP;

Takayuki Miyagawa, Toyonaka, JP;

Inventors:

Ichiki Takemoto, Kawanishi, JP;

Isao Yoshida, Ikeda, JP;

Takayuki Miyagawa, Toyonaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); H01L 21/027 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a chemically amplified positive resist composition comprising The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.


Find Patent Forward Citations

Takemoto, Ichiki. (2009). Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same (U.S. Patent No. 7556908). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7556908

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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