The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Aug. 27, 2003
Yosuke Inomata, Yokaichi, JP;
Yuko Fukawa, Yokaichi, JP;
Yosuke Inomata, Yokaichi, JP;
Yuko Fukawa, Yokaichi, JP;
Kyocera Corporation, Kyoto, JP;
Abstract
A dry etching apparatus including a plateprovided in parallel or nearly parallel with an RF electrodeto cover a substrateplaced on the RF electrodedirectly or through a tray. The plateis provided with planar or nearly planar obstaclesthat inhibit a gas and plasma from passing through the plateas well as opening portions. This makes it possible to achieve conditions under which etching residues attach to the surface of the substrate faster by trapping the etching residues in a space between the surface of the substrateand the plate. Fine textures can be thus formed efficiently on the surface of the substrate (FIG.).