The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Feb. 15, 2007
Chung-chih Feng, Kaohsiung, TW;
I-peng Yao, Kaohsiung, TW;
Lyang-gung Wang, Kaohsiung, TW;
Yung-chang Hung, Kaohsiung, TW;
Chung-Chih Feng, Kaohsiung, TW;
I-Peng Yao, Kaohsiung, TW;
Lyang-Gung Wang, Kaohsiung, TW;
Yung-Chang Hung, Kaohsiung, TW;
San Fang Chemical Industry Co., Ltd., Kaohsiung, TW;
Abstract
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.