The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2009

Filed:

Jan. 09, 2007
Applicants:

Noah R. Heller, Corte Madera, CA (US);

Peter F. Moritzburke, Corte Madera, CA (US);

Inventors:

Noah R. Heller, Corte Madera, CA (US);

Peter F. Moritzburke, Corte Madera, CA (US);

Assignee:

BESST, Inc., San Rafael, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
E21B 49/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A docking receiver () for a subsurface well () having a fluid inlet structure (), a riser pipe () and a docking apparatus () includes an upper section (A) and a lower section (A). The upper section (A) is secured to the riser pipe (). The lower section (A) is secured to the fluid inlet structure (). The lower section (A) receives the docking apparatus () into an engaged position wherein fluid communication between a first zone () and a second zone () of the well () is inhibited. The lower section (A) includes a contact surface (A) and a distal region (A). The contact surface (A) contacts the docking apparatus () when the docking apparatus () is in the engaged position. The distal region (A) is positioned more distally from a surface region () of the well () than the contact surface. The lower section (A) can have a lower inner diameter (UD,LD) that varies within the distal region (A). When the docking apparatus () is not in the engaged position with the docking receiver (), the first zone () is in fluid communication with the second zone ().


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