The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2009
Filed:
Jul. 25, 2006
Atsushi Tondokoro, Niigata-ken, JP;
Shinichi Tanaka, Niigata-ken, JP;
Atsushi Tondokoro, Niigata-ken, JP;
Shinichi Tanaka, Niigata-ken, JP;
TDK Corporation, Tokyo, JP;
Abstract
A method of processing an air bearing surface of a thin-film magnetic head slider is provided. A first silicon film, a first carbon film, a second silicon film, and a second carbon film are laminated in that order on a face of a thin-film magnetic head slider facing a medium. A protrusion resist pattern that forms protrusions is formed on the second carbon film. Portions of the second carbon film and the second silicon film that are not covered with the protrusion resist pattern are removed by reactive ion etching with O/CF. A third carbon film is formed on the first carbon film exposed by the removal of the portions. The protrusion resist pattern is removed to expose the protrusions including the second silicon film and the second carbon film. An ABS resist pattern is formed on exposed surfaces of the protrusions and the third carbon film. A surface not covered with the ABS resist pattern is processed to impart an ABS uneven pattern.